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| Position: Chinese Standard in English/GB/T 14849.4-2008 |
| GB/T 14849.4-2008 for chemical analysis of silicon metal - Part 4: Determination of elements content Inductively coupled plasma atomic emission spectrometric method (English Version) | |||
| Standard No.: | GB/T 14849.4-2008 | Status: | superseded remind me the status change |
| Target Language: | English | File Format: | |
| Word Count: | 3500 words | Translation Price(USD): | 60.0 remind me the price change |
| Implemented on: | 2008-12-1 | Delivery: | via email in 1~3 business day |
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| Standard No.: | GB/T 14849.4-2008 |
| English Name: | for chemical analysis of silicon metal - Part 4: Determination of elements content Inductively coupled plasma atomic emission spectrometric method |
| Chinese Name: | 工业硅化学分析方法 第4部分：电感耦合等离子体原子发射光谱法测定素含量 |
| Chinese Classification: | H17 Semimetal and semiconductor material analysis method |
| Professional Classification: | GB National Standard |
| ICS Classification: | 77.120.10 Aluminium and aluminium alloys |
| Source Content Issued by: | AQSIQ |
| Issued on: | 2008-6-9 |
| Implemented on: | 2008-12-1 |
| Status: | superseded |
| Superseded by: | GB/T 14849.4-2014 Methods for chemical analysis of silicon metal - Part 4:Determination of impurity contents - Inductively coupled plasma atomic emission spectrometric method |
| Superseded on: | 2015-8-1 |
| Target Language: | English |
| File Format: | |
| Word Count: | 3500 words |
| Translation Price(USD): | 60.0 |
| Delivery: | via email in 1~3 business day |