2025-12-15 10.1.14.108
Code of China Chinese Classification Professional Classification ICS Classification Latest News Value-added Services

Position: Chinese Standard in English/GB/T 28274-2012
GB/T 28274-2012   Silicon-based MEMS fabrication technology—The basic regulation of layout design (English Version)
Standard No.: GB/T 28274-2012 Status:valid remind me the status change

Email:

Target Language:English File Format:PDF
Word Count: 7000 words Translation Price(USD):210.0 remind me the price change

Email:

Implemented on:2012-12-1 Delivery: via email in 1~3 business day

→ → →

,,2012-12-1,141138181917720BE8AED1318FB1D
Standard No.: GB/T 28274-2012
English Name: Silicon-based MEMS fabrication technology—The basic regulation of layout design
Chinese Name: 硅基MEMS制造技术 版图设计基本规则
Chinese Classification: L55    Microcircuit in general
Professional Classification: GB    National Standard
Source Content Issued by: AQSIQ;SAC
Issued on: 2012-5-11
Implemented on: 2012-12-1
Status: valid
Target Language: English
File Format: PDF
Word Count: 7000 words
Translation Price(USD): 210.0
Delivery: via email in 1~3 business day
本标准规定了微结构加工时,光刻版图设计中图形设计应遵循的基本规则。
本标准适用于采用接触式单/双面光刻、氧化扩散、化学气相淀积(CVD)、物理气相淀积(PVD)、离子注入、反应离子刻蚀(RIE)、氢氧化钾(KOH)腐蚀、硅-玻璃对准静电结合、砂轮划片等基本工艺方法。
Code of China
Standard
GB/T 28274-2012  Silicon-based MEMS fabrication technology—The basic regulation of layout design (English Version)
Standard No.GB/T 28274-2012
Statusvalid
LanguageEnglish
File FormatPDF
Word Count7000 words
Price(USD)210.0
Implemented on2012-12-1
Deliveryvia email in 1~3 business day
Detail of GB/T 28274-2012
Standard No.
GB/T 28274-2012
English Name
Silicon-based MEMS fabrication technology—The basic regulation of layout design
Chinese Name
硅基MEMS制造技术 版图设计基本规则
Chinese Classification
L55
Professional Classification
GB
ICS Classification
Issued by
AQSIQ;SAC
Issued on
2012-5-11
Implemented on
2012-12-1
Status
valid
Superseded by
Superseded on
Abolished on
Superseding
Language
English
File Format
PDF
Word Count
7000 words
Price(USD)
210.0
Keywords
GB/T 28274-2012, GB 28274-2012, GBT 28274-2012, GB/T28274-2012, GB/T 28274, GB/T28274, GB28274-2012, GB 28274, GB28274, GBT28274-2012, GBT 28274, GBT28274
Introduction of GB/T 28274-2012
本标准规定了微结构加工时,光刻版图设计中图形设计应遵循的基本规则。
本标准适用于采用接触式单/双面光刻、氧化扩散、化学气相淀积(CVD)、物理气相淀积(PVD)、离子注入、反应离子刻蚀(RIE)、氢氧化钾(KOH)腐蚀、硅-玻璃对准静电结合、砂轮划片等基本工艺方法。
Contents of GB/T 28274-2012
About Us   |    Contact Us   |    Terms of Service   |    Privacy   |    Cancellation & Refund Policy   |    Payment
Tel: +86-10-8572 5655 | Fax: +86-10-8581 9515 | Email: coc@codeofchina.com | QQ: 672269886
Copyright: Beijing COC Tech Co., Ltd. 2008-2040
 
 
Keywords:
GB/T 28274-2012, GB 28274-2012, GBT 28274-2012, GB/T28274-2012, GB/T 28274, GB/T28274, GB28274-2012, GB 28274, GB28274, GBT28274-2012, GBT 28274, GBT28274