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| Position: Chinese Standard in English/GB/T 14142-1993 |
| GB/T 14142-1993 method for crystallographic perfection of epitaxial layers in silicon by etching techniques (English Version) | |||
| Standard No.: | GB/T 14142-1993 | Status: | superseded remind me the status change |
| Target Language: | English | File Format: | |
| Word Count: | 2500 words | Translation Price(USD): | 75.0 remind me the price change |
| Implemented on: | 1993-10-1 | Delivery: | via email in 1~3 business day |
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| Standard No.: | GB/T 14142-1993 |
| English Name: | method for crystallographic perfection of epitaxial layers in silicon by etching techniques |
| Chinese Name: | 硅外延层晶体完整性检验方法 腐蚀法 |
| Chinese Classification: | H26 Metal nondestructive testing method |
| Professional Classification: | GB National Standard |
| Source Content Issued by: | AQSIQ |
| Issued on: | 1993-2-6 |
| Implemented on: | 1993-10-1 |
| Status: | superseded |
| Superseded by: | GB/T 14142-2017 Test method for crystallographic perfection of epitaxial layers in silicon—Etching technique |
| Superseded on: | 2018-4-1 |
| Target Language: | English |
| File Format: | |
| Word Count: | 2500 words |
| Translation Price(USD): | 75.0 |
| Delivery: | via email in 1~3 business day |