GB/T 17169-1997 English Version, GB/T 17169-1997 Test method for the surface quality of polished silicon wafers and epitaxial wafers by optical-reflection (English Version)

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GB/T 17169-1997 Test method for the surface quality of polished silicon wafers and epitaxial wafers by optical-reflection (English Version)
Standard No.:	GB/T 17169-1997	Status:	abolished remind me the status change Email:
Target Language:	English	File Format:	PDF
Word Count:	4500 words	Translation Price(USD):	380.0 remind me the price change Email:
Implemented on:	1998-8-1	Delivery:	via email in 1~3 business day

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Standard No.:	GB/T 17169-1997
English Name:	Test method for the surface quality of polished silicon wafers and epitaxial wafers by optical-reflection
Chinese Name:	硅抛光片和外延片表面质量光反射测试方法
Chinese Classification:	H24 Metallographic testing method
Professional Classification:	GB National Standard
ICS Classification:	29.045 29.045 Semiconducting materials 29.045
Source Content Issued by:	SBTS
Issued on:	1997-01-02
Implemented on:	1998-8-1
Status:	abolished
Abolished on:	2005-10-14
Target Language:	English
File Format:	PDF
Word Count:	4500 words
Translation Price(USD):	380.0
Delivery:	via email in 1~3 business day

Standard

GB/T 17169-1997 Test method for the surface quality of polished silicon wafers and epitaxial wafers by optical-reflection (English Version)
Standard No.	GB/T 17169-1997
Status	abolished
Language	English
File Format	PDF
Word Count	4500 words
Price(USD)	380.0
Implemented on	1998-8-1
Delivery	via email in 1~3 business day

Detail of GB/T 17169-1997

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Introduction of GB/T 17169-1997

本标准规定了半导体硅抛光片和外延片表面常见缺陷的光反射无损检验方法。本标准适用于半导体硅抛光片和外延片表面质量的无损检验。本标准的检验结果与GB/T 6624、GB/T 14142的检验结果一致。

Contents of GB/T 17169-1997

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