GB/T 27581-2011 English Version, GB/T 27581-2011 Electromagnetic interference shielding film—Electroless copper plating solution—Method of determining concentration of Ni2+ and Cu2+ (English Version)

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GB/T 27581-2011 Electromagnetic interference shielding film—Electroless copper plating solution—Method of determining concentration of Ni2+ and Cu2+ (English Version)
Standard No.:	GB/T 27581-2011	Status:	valid remind me the status change Email:
Target Language:	English	File Format:	PDF
Word Count:	4000 words	Translation Price(USD):	120.0 remind me the price change Email:
Implemented on:	2012-3-1	Delivery:	via email in 1~3 business day

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Standard No.:	GB/T 27581-2011
English Name:	Electromagnetic interference shielding film—Electroless copper plating solution—Method of determining concentration of Ni2+ and Cu2+
Chinese Name:	电磁屏蔽膜化学镀铜溶液镍离子和铜离子含量测定方法
Chinese Classification:	G15 Organic chemicals in general
Professional Classification:	GB National Standard
ICS Classification:	71.080.99 71.080.99 Other organic chemicals 71.080.99
Source Content Issued by:	AQSIQ; SAC
Issued on:	2011-12-05
Implemented on:	2012-3-1
Status:	valid
Target Language:	English
File Format:	PDF
Word Count:	4000 words
Translation Price(USD):	120.0
Delivery:	via email in 1~3 business day

Standard

GB/T 27581-2011 Electromagnetic interference shielding film—Electroless copper plating solution—Method of determining concentration of Ni2+ and Cu2+ (English Version)
Standard No.	GB/T 27581-2011
Status	valid
Language	English
File Format	PDF
Word Count	4000 words
Price(USD)	120.0
Implemented on	2012-3-1
Delivery	via email in 1~3 business day

Detail of GB/T 27581-2011

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Introduction of GB/T 27581-2011

本标准规定了电磁屏蔽膜用化学镀铜溶液中镍离子和铜离子含量的测定方法。
本标准适用于电磁屏蔽膜用化学镀铜溶液中镍离子和铜离子含量的测试。测定范围：化学镀铜溶液中镍离子浓度以NiSO4 .6H2O计为0.20g/L～2.00g/L；化学镀铜溶液中铜离子浓度以CuSO4 .5H2O计为5.0g/L～60.0g/L。

Contents of GB/T 27581-2011

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