Standard No.:	GB/T 29056-2012
English Name:	Trichlorosilane for silicon epitaxy—Determination of boron,aluminium,phosphorus,vanadium,chrome,manganese,iron,cobalt,nickel,copper,arsenic,molybdenum and antimony content—Inductively coupled plasma mass spectrometric method
Chinese Name:	硅外延用三氯氢硅化学分析方法 硼、铝、磷、钒、铬、锰、铁、钴、镍、铜、钼、砷和锑量的测定 电感耦合等离子体质谱法
Chinese Classification:	L90    Special electronic technology material
Professional Classification:	GB    National Standard
Source Content Issued by:	AQSIQ; SAC
Issued on:	2012-12-31
Implemented on:	2013-10-1
Status:	to be superseded
Superseded by:	GB/T 29056-2025 Determination of impurity content in trichlorosilane for silicon epitaxy - Inductively coupled plasma mass spectrometry
Superseded on:	2026-5-1
Target Language:	English
File Format:	PDF
Word Count:	6000 words
Translation Price(USD):	180.0
Delivery:	via email in 1~3 business day

本标准规定了用电感耦合等离子体质谱仪(ICP-MS)测定硅外延用三氯氢硅(SiHCl3)中硼、铝、磷、钒、铬、锰、铁、钴、镍、铜、钼、砷、锑等痕量元素含量的方法。
本标准适用于硅外延用三氯氢硅(SiHCl3)中硼、铝、磷、钒、铬、锰、铁、钴、镍、铜、钼、砷、锑等含量的测定。