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Standard
| SJ 20744-1999 General rule of infrared absorption spectral analysis for the impurity concentration in semiconductor materials (English Version) |
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Detail of SJ 20744-1999
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Introduction of SJ 20744-1999
本标准规定了半导体材料中杂质含量的红外吸收分析方法的术语、基本原理、仪器设备、样口制备、测量条件、测量步骤和测量结果的计算。本标准适用于在红外光谱区为透明的并在该区域产生杂质吸收带的任何半导体单晶材料红外分析方法。
Contents of SJ 20744-1999