Standard No.:	T/CEMIA 036-2023
English Name:	High alkali concentration negative photoresist developer for semiconductor display
Chinese Name:	半导体显示用高碱浓度负胶显影液
Chinese Classification:	L90    Special electronic technology material
Professional Classification:	T/    Social Organization Standard
Source Content Issued by:	CEMIA
Issued on:	2023-11-06
Implemented on:	2023-11-30
Status:	valid
Target Language:	English
File Format:	PDF

本文件适用于由氢氧化钾、表面活性剂和水组成，其中氢氧化钾的质量百分比大于8%的半导体显示用高碱浓度负胶显影液。
此半导体显示用高碱浓度负胶显影液主要用于半导体制程中负性光刻胶的显影，及薄膜晶体管液晶显示器（TFT-LCD）或有机发光二极管显示器（OLED）彩膜工艺光刻胶的显影。