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| Position: Chinese Standard in English/YS/T 26-2016 |
| YS/T 26-2016 Test methods for edge contour of silicon wafers (English Version) | |||
| Standard No.: | YS/T 26-2016 | Status: | valid remind me the status change |
| Target Language: | English | File Format: | |
| Word Count: | 5500 words | Translation Price(USD): | 165.0 remind me the price change |
| Implemented on: | 2017-1-1 | Delivery: | via email in 1~3 business day |
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| Standard No.: | YS/T 26-2016 |
| English Name: | Test methods for edge contour of silicon wafers |
| Chinese Name: | 硅片边缘轮廓检验方法 |
| Chinese Classification: | H21 Metal physical property test method |
| Professional Classification: | YS Professional Standard - Non-ferrous Metal |
| Source Content Issued by: | MIIT |
| Issued on: | 2016-07-11 |
| Implemented on: | 2017-1-1 |
| Status: | valid |
| Superseding: | YS/T 26-1992 Test method for silicon wafer edge |
| Target Language: | English |
| File Format: | |
| Word Count: | 5500 words |
| Translation Price(USD): | 165.0 |
| Delivery: | via email in 1~3 business day |