Standard No.:	GB/T 13388-1992
English Name:	Method for measuring crystallographic orientation of flats on single crystal silicon slices and wafers by X-ray techniques
Chinese Name:	硅片参考面结晶学取向X射线测量方法
Chinese Classification:	H21    Metal physical property test method
Professional Classification:	GB    National Standard
Source Content Issued by:	CSBTS
Issued on:	1992-02-19
Implemented on:	1992-10-1
Status:	superseded
Superseded by:	GB/T 13388-2009 Method for measuring crystallographic orientation of flats on single-crystal silicon slices and wafers by X-ray techniques
Superseded on:	2010-6-1
Target Language:	English
File Format:	PDF
Word Count:	2500 words
Translation Price(USD):	224.0
Delivery:	via email in 1~3 business day

本标准规定了用Ｘ射线技术测量硅片参考面结晶学取向的方法。本标准适用于硅片参考面结晶学取向与参考面规定取向之间角度偏差的测量。硅片直径为50～125mm，参考面长度为10～50mm。本标准不适用于硅片规定取向在与参考面和硅片表面相垂直的平面内的投影与硅片表面法线之间夹角不小于3°的硅片的测量。