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| Position: Chinese Standard in English/GB/T 14849.4-2014 |
| GB/T 14849.4-2014 Methods for chemical analysis of silicon metal - Part 4:Determination of impurity contents - Inductively coupled plasma atomic emission spectrometric method (English Version) | |||
| Standard No.: | GB/T 14849.4-2014 | Status: | valid remind me the status change
Email: |
| Target Language: | English | File Format: | |
| Word Count: | 6000 words | Translation Price(USD): | 120.0 remind me the price change
Email: |
| Implemented on: | 2015-8-1 | Delivery: | via email in 1~3 business day |
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| Standard No.: | GB/T 14849.4-2014 |
| English Name: | Methods for chemical analysis of silicon metal - Part 4:Determination of impurity contents - Inductively coupled plasma atomic emission spectrometric method |
| Chinese Name: | 工业硅化学分析方法 第4部分:杂质元素含量的测定 电感耦合等离子体原子发射光谱法 |
| Chinese Classification: | H12 Light metals and their alloys analysis method |
| Professional Classification: | GB National Standard |
| ICS Classification: | 77.120.10 77.120.10 Aluminium and aluminium alloys 77.120.10 |
| Source Content Issued by: | AQSIQ; SAC |
| Issued on: | 2014-12-05 |
| Implemented on: | 2015-8-1 |
| Status: | valid |
| Superseding: | GB/T 14849.4-2008 for chemical analysis of silicon metal - Part 4: Determination of elements content Inductively coupled plasma atomic emission spectrometric method |
| Target Language: | English |
| File Format: | |
| Word Count: | 6000 words |
| Translation Price(USD): | 120.0 |
| Delivery: | via email in 1~3 business day |
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| GB/T 14849.4-2014 Methods for chemical analysis of silicon metal - Part 4:Determination of impurity contents - Inductively coupled plasma atomic emission spectrometric method (English Version) | |||
| Standard No. | GB/T 14849.4-2014 | ||
| Status | valid | ||
| Language | English | ||
| File Format | |||
| Word Count | 6000 words | ||
| Price(USD) | 120.0 | ||
| Implemented on | 2015-8-1 | ||
| Delivery | via email in 1~3 business day | ||
| Standard No. |
| GB/T 14849.4-2014 |
| English Name |
| Methods for chemical analysis of silicon metal - Part 4:Determination of impurity contents - Inductively coupled plasma atomic emission spectrometric method |
| Chinese Name |
| 工业硅化学分析方法 第4部分:杂质元素含量的测定 电感耦合等离子体原子发射光谱法 |
| Chinese Classification |
| H12 |
| Professional Classification |
| GB |
| ICS Classification |
| Issued by |
| AQSIQ; SAC |
| Issued on |
| 2014-12-05 |
| Implemented on |
| 2015-8-1 |
| Status |
| valid |
| Superseded by |
| Superseded on |
| Abolished on |
| Superseding |
| GB/T 14849.4-2008 for chemical analysis of silicon metal - Part 4: Determination of elements content Inductively coupled plasma atomic emission spectrometric method |
| Language |
| English |
| File Format |
| Word Count |
| 6000 words |
| Price(USD) |
| 120.0 |
| Keywords |
| GB/T 14849.4-2014, GB 14849.4-2014, GBT 14849.4-2014, GB/T14849.4-2014, GB/T 14849.4, GB/T14849.4, GB14849.4-2014, GB 14849.4, GB14849.4, GBT14849.4-2014, GBT 14849.4, GBT14849.4 |
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| Keywords: | ||
| GB/T 14849.4-2014, GB 14849.4-2014, GBT 14849.4-2014, GB/T14849.4-2014, GB/T 14849.4, GB/T14849.4, GB14849.4-2014, GB 14849.4, GB14849.4, GBT14849.4-2014, GBT 14849.4, GBT14849.4 | ||