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| Position: Chinese Standard in English/GB/T 19444-2004 |
| GB/T 19444-2004 Oxygen precipitation characterization of silicon wafers by measurement of interstitial oxygen reduction (English Version) | |||
| Standard No.: | GB/T 19444-2004 | Status: | to be superseded remind me the status change |
| Target Language: | English | File Format: | |
| Word Count: | 3000 words | Translation Price(USD): | 85.0 remind me the price change |
| Implemented on: | 2004-7-1 | Delivery: | via email in 1~3 business day |
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| Standard No.: | GB/T 19444-2004 |
| English Name: | Oxygen precipitation characterization of silicon wafers by measurement of interstitial oxygen reduction |
| Chinese Name: | 硅片氧沉淀特性的测定-间隙氧含量减少法 |
| Chinese Classification: | H26 Metal nondestructive testing method |
| Professional Classification: | GB National Standard |
| ICS Classification: | 29.040.01 Insulating fluids in general |
| Source Content Issued by: | AQSIQ;SAC |
| Issued on: | 2004-2-5 |
| Implemented on: | 2004-7-1 |
| Status: | to be superseded |
| Superseded by: | GB/T 19444-2025 Test method for oxygen precipition characteristics of silicon wafers—Interstitial oxygen reduction |
| Superseded on: | 2026-1-1 |
| Target Language: | English |
| File Format: | |
| Word Count: | 3000 words |
| Translation Price(USD): | 85.0 |
| Delivery: | via email in 1~3 business day |