Standard No.:	GB/T 20176-2025
English Name:	Surface chemical analysis—Secondary-ion mass spectrometry—Determination of boron atomic concentration in silicon using uniformly doped materials
Chinese Name:	表面化学分析 二次离子质谱 用均匀掺杂物质测定硅中硼的原子浓度
Chinese Classification:	G04    Basic standards and general methods
Professional Classification:	GB    National Standard
ICS Classification:	71.040.40 71.040.40    Chemical analysis 71.040.40
Source Content Issued by:	SAMR; SAC
Issued on:	2025-06-30
Implemented on:	2026-1-1
Status:	to be valid
Superseding:	GB/T 20176-2006 Surface chemical analysis-Secondary-ion mass spectrometry-Determination of boron atomic concentration in silicon using uniformly doped materials
Target Language:	English
File Format:	PDF
Word Count:	12500 words
Translation Price(USD):	375.0
Delivery:	via email in 1~5 business day

本文件详细说明了用标定的均匀掺杂物质（用注入硼的参考物质校准）确定单晶硅中硼的原子浓度的二次离子质谱方法。它适用于均匀掺杂硼浓度范围从1×1016 atoms/cm3～1×1020 atoms/cm3。