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| Position: Chinese Standard in English/GB/T 20176-2006 |
| GB/T 20176-2006 Surface chemical analysis-Secondary-ion mass spectrometry-Determination of boron atomic concentration in silicon using uniformly doped materials (English Version) | |||
| Standard No.: | GB/T 20176-2006 | Status: | to be superseded remind me the status change |
| Target Language: | English | File Format: | |
| Word Count: | 8000 words | Translation Price(USD): | 220.0 remind me the price change |
| Implemented on: | 2006-11-1 | Delivery: | via email in 1~3 business day |
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| Standard No.: | GB/T 20176-2006 |
| English Name: | Surface chemical analysis-Secondary-ion mass spectrometry-Determination of boron atomic concentration in silicon using uniformly doped materials |
| Chinese Name: | 表面化学分析 二次离子质谱 用均匀掺杂物质测定硅中硼的原子浓度 |
| Chinese Classification: | N33 Electron optics and other physical optics instrument |
| Professional Classification: | GB National Standard |
| ICS Classification: | 71.040.40 Chemical analysis |
| Source Content Issued by: | SAC |
| Issued on: | 2006-03-27 |
| Implemented on: | 2006-11-1 |
| Status: | to be superseded |
| Superseded by: | GB/T 20176-2025 Surface chemical analysis—Secondary-ion mass spectrometry—Determination of boron atomic concentration in silicon using uniformly doped materials |
| Superseded on: | 2026-1-1 |
| Target Language: | English |
| File Format: | |
| Word Count: | 8000 words |
| Translation Price(USD): | 220.0 |
| Delivery: | via email in 1~3 business day |