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Chinese National Standard Category: Metal physical property test method

English Title: Test method for dislocation imaging in III-nitride semiconductor materials—Transmission electron microscopy
Chinese Title: III族氮化物半导体材料中位错成像的测试 透射电子显微镜法
Standard No.: GB/T 44558-2024
Category No.: H21
Issued by: SAMR, SAC
Issued on: 2024-09-29
Implemented on: 2025-4-1
Status: valid
Superseded by:
Superseded on:
Abolished on:
Superseding:
Word Count:9000 words
Similar Standards: T/ZSA 231-2024   GB/T 14847-2025   YS/T 273.2-2006   YS/T 535.2-2009   YS/T 581.5-2006   YS/T 581.6-2006   YS/T 581.10-2006   GB/T 46227-2025   GB/T 20831-2025   GB/T 5161-2025   GB/T 19444-2025   GB/T 6148-2025   GB/T 6147-2025   GB/T 41079.3-2024   GB/T 44558-2024   GB/T 44330-2024   GB/T 24578-2024   GB/T 43894.1-2024   GB/T 8758-1988   GB/T 6522-1986  
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