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| Chinese National Standard Category: Metal physical property test method |
| English Title: | Test method for thickness of lightly doped silicon epitaxial layers on heavily doped silicon substrates - Infrared reflectance method |
| Chinese Title: | 重掺杂衬底上轻掺杂硅外延层厚度的测试 红外反射法 |
| Standard No.: | GB/T 14847-2025 |
| Category No.: | H21 |
| Issued by: | SAMR, SAC |
| Issued on: | 2025-10-31 |
| Implemented on: | 2026-5-1 |
| Status: | to be valid |
| Superseded by: | |
| Superseded on: | |
| Abolished on: | |
| Superseding: | GB/T 14847-2010 Test method for thickness of lightly doped silicon epitaxial layers on heavily doped silicon substrates by infrared reflectance |
| Word Count: | 6500 words |
| Similar Standards: | GB/T 14847-2025 GB/T 46227-2025 GB/T 20831-2025 GB/T 5161-2025 GB/T 19444-2025 GB/T 6148-2025 GB/T 6147-2025 GB/T 41079.3-2024 GB/T 44558-2024 GB/T 44330-2024 GB/T 24578-2024 GB/T 43894.1-2024 GB/T 43315-2023 GB/T 43313-2023 T/ZSA 231-2024 GB/T 23365-2023 GB/T 43092-2023 GB/T 43093-2023 GB/T 43096-2023 GB/T 42907-2023 |
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